This robotic arm is designed for material handling in high-cleanliness conditions, employing a closed-loop servo control system, and is suitable for high-speed transfer operations.
The dual-arm configuration can achieve high-speed wafer transfer.
Using a dual Z-axis lifting structure, rapid lifting and lowering of the main body can be achieved within a high travel range.
Carrying capacity: Below 3Kg at the third joint of the arm.
Capable of being paired with different types of Forks to meet various wafer transfer requirements.
Wafer holding methods: Vacuum suction type/Clamping type/Clamping and lifting type/Contact Bernoulli type / Non-contact Bernoulli type.
Based on the equipment layout, you can choose either an upper or lower fixing method.
Handling Items | 3"/4"/6"/8"/12" Wafers | ||
Movable Range (Arm Travel Distance) | Arm | Theta Rotation | Lifting: |
290/376mm |
340° |
300/400/500 | |
Transfer Speed (Average Speed) | 750mm/S |
235~340°/S |
500mm/S |
Arm Type | Dual Arms | ||
Handling Height | 820-1020mm | ||
Repeatability Accuracy | Within ±0.1mm | ||
Communication Protocol | HEX/ASCII | ||
Communication Method | EtherNet/RS232 | ||
Cleanliness | Highest ISO Class 1 | ||
Facility Requirements |
Power: 220V, 10A Vacuum: -70~-90Kpa Positive Pressure: 0.1~0.5Mpa |
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