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This robotic arm is designed for material handling in high-cleanliness conditions, employing a closed-loop servo control system, and is suitable for high-speed transfer operations.

The robot is equipped with four forks to accommodate dry/wet robotic arms.

The dual-arm configuration can achieve high-speed wafer transfer.

Using a dual Z-axis lifting structure, rapid lifting and lowering of the main body can be achieved within a high travel range.

Carrying capacity: Below 3Kg at the third joint of the arm.

Capable of being paired with different types of Forks to meet various wafer transfer requirements.

Wafer holding methods: Vacuum suction type/Clamping type/Clamping and lifting type/Contact Bernoulli type / Non-contact Bernoulli type.

Based on the equipment layout, you can choose either an upper or lower fixing method.

Product Specifications
Handling Items 3"/4"/6"/8"/12" Wafers
Movable Range (Arm Travel Distance)  Arm Theta Rotation Lifting:

290/376mm

340°

300/400/500
Transfer Speed (Average Speed) 750mm/S

235~340°/S

500mm/S

Arm Type Dual Arms
Handling Height 820-1020mm
Repeatability Accuracy Within ±0.1mm
Communication Protocol HEX/ASCII
Communication Method EtherNet/RS232
Cleanliness Highest ISO Class 1
Facility Requirements Power: 220V, 10A
Vacuum: -70~-90Kpa
Positive Pressure: 0.1~0.5Mpa

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Disclaimer: The appearance, specifications, performance descriptions, comparative data, and other information regarding the products displayed on this website are based on internal testing and experiments conducted in FORTREND’s laboratory. This information is for reference purposes only, and the final product may vary.

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